Page 317 - Catalogue 2015
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Solkleen IP

Composition: Degreasing mixture contains: 1,1-dichloro-1-fluoroethane and ~20% IPA.

m.p. -43 0C; b.p. 40 0C

Cat. No.      Solkleen IP
 196202       CP

Application:     Used in vapor degreasers or chamber-cleaning machines.

Acidity (as HCl)                 max. 0.003%   2-Propanol                                   19-21%
Color (APHA)                     max. 25       Residue after evaporation                    max. 0.002%w/w
Assay main constituent           79-81%        Water (KF)                                   max. 0.05%w/w

   Solvokleen 20

Composition: HFC-365mfc with low content of trans-Dichloroethylene.

D 1.253; m.p. -43 0C; b.p. 40 0C;

Warning; H:333-412; P:273

Cat. No.      Solvokleen 20
 189205       AR

Application:     Non-azeotropic mixture used in vapor degreasers or chamber-cleaning machines.

Appearance                       Clear liquid  Purity (GC, on anhydrous basis)              min. 99.5%
Color (APHA)                     max. 15       Acidity (as HCl)                             max. 0.001%
Composition by GC                Complies      Residue after evaporation                    max. 0.0005%w/w

   Solvokleen E1.5

Composition: HFC-365mfc / trans-Dichloroethylene with low stabilizer content.

D 1.22; m.p. -42°C; b.p. 35.8°C;

H:333; EUH:210;

Cat. No.      Solvokleen E1.5
 189505       AR

Application:     Azeotropic mixture used in vapor degreasers or chamber-cleaning machines.

Appearance                       Clear liquid  Water (KF)                                   max. 0.01%w/w
Color (APHA)                     max. 10       Acidity (as HCl)                             max. 0.0005%
Composition by GC                Complies      Residue after evaporation                    max. 0.0005%w/w
Purity (GC, on anhydrous basis)  min. 99.7%

Cat. No.      Solvokleen E1.5
189502        CP

Appearance                       Clear liquid  Water (KF)                                   max. 0.03%w/w
Composition by GC                Complies      Acidity (as HCl)                             max. 0.001%
Purity (GC, on anhydrous basis)  min. 99.5%    Residue after evaporation                    max. 0.001%w/w
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