Page 82 - R2017-REC-ECE-UG Syllabus
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Department of ECE, REC




                REFERENCES
                1. R Bose, “Information Theory, Coding and Crptography”, TMH 2007
                2. S Gravano, “Introduction to Error Control Codes”, Oxford University Press 2007
                3. Amitabha Bhattacharya, “Digital Communication”, TMH 2006
                4.Mark Nelson, “Data Compression  Book”, BPB Publication  1992.
                5. Watkinson J, “Compression in Video and Audio”,  Focal Press, London, 1995.



                EC17E63              MICRO ELECTRO MECHANICAL SYSTEMS                          L  T  P  C
                                                                                               3  0   0  3
                PREREQUISITE: Knowledge on Electronic devices, IC fabrication process and Engineering Chemistry

                OBJECTIVES:
                The students are able to:
                    •   To introduce the fundamental concept of MEMS & Microsystem.
                    •   To gain an understanding of standard micro-fabrication techniques.
                    •   To understand the fundamental principles behind the operation of MEMS devices/systems.
                    •   To apply knowledge of microfabrication techniques and applications to the design and manufacturing
                           of MEMS devices.
                    •   To acquire knowledge in materials and  appreciate the importance of microsystem packaging

                UNIT I        MEMS OVERVIEW                                                       9
                MEMS  and  microsystems,  evolution  of  micro  fabrication,  microsystem  and  microelectronics,  intrinsic
                characteristics of MEMS, application of Microsystems

                UNIT II       MICRO SENSOR AND ACTUATORS                                          9
                Working principles of MEMS Sensors -Acoustic wave sensors, Bio sensors, Chemical sensor, optical sensors,
                Micro accelerometer, Capacitive and Piezo Resistive Pressure sensors and Thermal Sensors, Micro actuation –
                thermal  forces,  Shape  Memory  alloys,  Piezo  electric  Crystal  and  electrostatic  forces,  Applications-
                Microgripper, Microvalve, Micropump, Micromotor

                UNIT III      MEMS MATERIAL AND PROCESSES                                         9
                Structure of silicon and other materials, Silicon Compounds - silicon dioxide, silicon carbide, silicon nitride,
                and  polycrystalline  silicon,  Polymer  for  MEMS,  Silicon  wafer  processing,  Thin-film  deposition-  Physical
                Vapor Deposition, Chemical vapor deposition, Lithography, Wet Etching and Dry Etching.

                UNIT IV       MICROMACHINING                                                      9
                Bulk micromachining – overview of etching, isotropic and anisotropic etching, wet etchants, etch stop, dry
                etching,  comparison  of  wet  and  dry  etching,  Surface  micromachining  –  General  description,  process,
                mechanical problems associated with surface micromachining, LIGA-  General description, process, material
                for substrate and photoresists, Electroplating, SLIGA process

                UNIT V         MICROSYSTEM PACKAGING                                              9
                Overview of packaging, packaging design, selection of packaging materials, levels of microsystem packaging,
                interface in microsystem packaging, essential packaging technologies, Assembly of micro systems


                Curriculum and Syllabus | B.E. Electronics and Communication Engineering | R2017      Page 82
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